For removing exposed resist during the positive photofabrication process.

• Disolves exposed photoresist
• Concentrated formulation - dilute one part developer to ten parts water
• For best results, use in conjunction with M.G. Foam Brush (Cat. No.416-S)
• Also available in the M.G. Photofabrication Kit (Cat. No. 416-K) .

Training Videos

Professional Prototyping Process Menu
Photofabrication Video